Deposition and measurements of thin metal and dielectric fi lms intended for the nanoelectronics and microwave technique

Aim of project
New nanotechnologies require not only high resolution photolithographic processes but also deposition of very thin (the order of few nanometers) metal and dielectric films having repeatable and electromagnetic properties. When film thickness becomes very thin, their physical properties may be different than the properties of bulk materials or thin fi lms having thickness in the range of microns. In addition, traditional measurements methods may be inadequate for very thin films characterization. The main aim of this project is deposition and characterization of extremely thin metal and dielectric films. Single post and split post dielectric resonator techniques will be used for measurements of surface resistance of thin metal films deposited on low loss dielectric substrates.

Expected results
Al, Cu, Ag, Au, Fe, Mo, W, Pd, Pt and ITO films will be measured employing those resonators. For comparison, DC and low frequency measurement techniques will also be employed.