Development of a system for investigation of semiconductor sensing microstructures produced with novel plasma techniques

Aim of project
The aim of the project is to combine the potential of the Institute of Microelectronics and Optoelectronics (IMiO) in the field of designing, characterization and fabrication of semiconductor microstructures and devices, in particular utilizing thin sensing layers, with the potential of the Institute of Electronic Systems (ISE) in the fi eld of design of analytical systems for examining microsystems for applications in biochemistry and medical diagnostics. The realization of the project will be based on an already development analytical system designed in ISE in order to adapt it to constructional requirements of sensing devices fabricated in IMiO (e.g. field effect transistors with open gate, where gate area exhibits unique properties).

Expected results
A modern and original research tool for various applications will be developed in the department, in particular for the examination of the usage of modern thin sensing films. The proposed system gives fully fl exible research set for applications in currently extremely fast growing disciplines like biochemistry and medical diagnostics. A feature of quick devices installation will be its great advantage. The set-up will give a chance for continuous improvement of the system with parameters determined through the selection of functional materials of the sensing film.