Warsaw University of Technology / Research / Catalogue of Research Projects of Warsaw University Of Technology / Development of science and knowledge / Faculty of Electronics and Information Technology

Plasma enhanced chemical vapour deposition (PECVD) as a fabrication method of ultrathin silicon oxynitride layers for CMOS-ULSI technology

supervisor Prof. Romuald B. Beck, Ph.D., D.Sc.
e-mail r.beck@imio.pw.edu.pl
tel. +48 22 234 75 34
beginning 2007.03.28
end 2008.03.27

Aim of project
The aim of the project is to enable the fi nal stages of the research work and preparations of the Ph.D. dissertation of Robert Mroczyński, M.Sc.

Expected results
Completion of a Ph.D. dissertation.